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CVD of pure copper films from amidinate precursor
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L. Aloui, V. Krisuyk, B. Sarapata, N. Prud’homme, F. Senocq, D. Samélor, C. Vahlas |
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Publication year: |
2009 |
Language: |
English |
Abstract
This paper reports on the use of a novel copper(I) amidinate compound [Cu(i-Pr-MeAMD)]2 to produce copper films in conventional low pressure CVD using hydrogen as reducing gas-reagent. Copper films were deposited on steel, silicon and SiO2/Si substrates. Their composition, morphology, conductivity and growth rate were investigated in the ... more |
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